The only photoresist film on the market today that requires absolutely no washout
RapidMask films are dry processing and self adhesive photoresist films which are by far the most innovative films available. With fine detail halftone making ability and strong blast resistance the combination of RapidMask High Detail and RapidMask High Tack provide an effortless sandcarving experience. RapidMask is as simple as expose apply and blast.
NOTE: Availability and lead time may vary for some formats, please allow extra time for order fulfilment or call (800) 643-1037 for more details or lead time estimate.
- Dry Processing
- Self Adhesive
- Fine halftone making ability
- Strong Blast resistance
RapidMask™ requires photo-NEGATIVE artwork.
CLEAR = BLAST. Typically, artwork imaged area should not exceed RapidMask™ film sheet or
roll size. Imaged areas of artwork should have opaque borders (approx. 1/8 inch). RapidMask™ film
remains photosensitive through blasting if not protected from light.
Minimum line resolution
High Detail 2mil (use minimum 220 grit size and negative artwork with Dmax 3.0)
High Tack 4mil (use minimum 180 grit size and negative art work with Dmax 3.0)
High Detail Up to 65dpi (use minimum 180 grit to 45dpi 220 or finer above 45dpi)
Blast depth High Detail (50u) frost to approx. 1/16" High Tack (100u) frost to approx. 3/16"
* The above specifications are based on using a genuine artwork film NEGATIVE with a D(min) UV
clear area of <1.0, and a D(max) UV opaque area of >3.0 as measured with a UV densitometer.
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This stuff is great!
Count me as a RapidMask evangelist. This stuff is great! It gives us the ability to do high detail and high volume without the washout wetness in a compact size! (originally reviewed 04/01/20)